Histomer Zi c Mask

Histomer Formula 201 Soothing and regenerating mask with plant stem cells and free zinc oxide, to provide red or sensitive skin with instant relief and rebalance seborrheic skin.

Soothing and regenerating mask containing Plant Stem Cells and Zinc Oxide to regenerate and relieve reddened or sensitized skin, and to restore the balance of oily skin and/or of skin with a tendency to acne. Instantly soothes irritations, and attenuates the tendency to excessive oiliness.

​Active Ingredients:

• Zinc Oxide. Classic remedy proposed by the pharmacopoeia to soothe inflammation, and absorb and neutralize irritant substances.

• Vitamin E (Tocoferyl Acetate) vitamin with anti-free radical, anti-oxidant, anti-inflammatory properties.

• Syringa Vulgaris Stem Cell Extract performs an intense regenerating and moderating action on excessive sebum secretion.

• Bisabolol, Beta-Sitosterol, typical substances that soothe irritations.

• Zinc oxide is an astringent. Astringents help reduce the appearance of large pores, cleanse skin, and may help tighten skin. Zinc oxide has mild astringent properties. It helps absorb excess oils from the surface of your skin and may reduce the appearance of irritation and blemishes.